THE NEXAR SYSTEM PLATFORM
Every LPKF NEXAR system is built on the same core philosophy: process parameters developed at the R&D stage transfer directly into production without re-qualification. Systems are available in manual, wafer-automated, and panel-automated configurations from pilot lines running mixed substrate types to 24/7 high-volume manufacturing with full fab automation. Wafer formats up to 300 mm and panels up to 515 mm × 510 mm are supported across all three process families. Technology stays the same at every stage. Only the automation level changes.
LPKF NEXAR LIDE
The Foundation Every Glass Packaging Architecture Builds On.
NEXAR LIDE systems form through-glass vias, blind vias, cavities, and complex glass microstructures on substrates of 515 mm × 510 mm with the accuracy and yield consistency that production packaging lines require.
What the system delivers:
- Via diameters down to 5 µm, aspect ratios up to 1:50
- Sidewall roughness Ra < 0.1 µm across the full substrate area
- Positional accuracy ±5 µm on panels of 515 mm× 510 mm
- NG rates below 5 ppm at production yield
- Single-shot processing of glass thicknesses from 0.2 to 1.1 mm
Beyond TGVs, the same system handles blind glass vias, microfluidic channels, optical V-grooves, precision cavities, dicing streets, and multi-level 2.5D structures all on one substrate, in one process step. No mechanical contact, no thermal damage, no re-tooling between feature types.
NEXAR ABLATE
Damage-Free RDL Removal. Zero SeWaRe.
NEXAR Ablate systems remove copper and polymer dielectric redistribution layers from glass substrates with sub-micron accuracy while keeping the glass core structurally intact through every downstream process step.
What the system delivers:
- Zero SeWaRe initiation confirmed by cross-sectional analysis across production runs
- Sub-micron positioning accuracy with a minimal heat-affected zone
- Full glass core integrity preserved through all downstream stages
- Compatible with Copper, ABF, and polymer dielectric stacks on borosilicate, fused silica, and ultra-thin glass
- Real-time ablation depth control with inline defect inspection on every substrate
The system processes both single-layer and multi-layer RDL stacks, adapts to varying stack compositions without recipe overhaul, and confirms complete removal on every substrate before it moves downstream. Designed for glass core substrate singulation, fan-out panel edge preparation, and glass interposer processing at scale, without yield surprises.
NEXAR BOND
Glass-to-Glass Bonding. Fast. Robust. Permanent.
NEXAR Bond systems fuse glass substrates directly to each other at production speed, on panels of 515 mm × 510 mm, with the thermal budget and contamination control that advanced packaging architectures demand.
What the system delivers:
• Bonding speeds up to 250 mm/s along freeform programmable paths
• Gap bridging up to 15 µm tolerates TTV variation and ISO Class 6 particles
• 50 µm bond seam width with alignment accuracy below 5 µm
• Bulk substrate stays at room temperature throughout adjacent LIDE features unaffected
• 600–4,000 mm bond line per minute throughput at panel scale
• >90% uptime, ISO Class 5-6 cleanroom compatible
The system bonds around features —TGVs, cavities, and embedded components without full-area thermal exposure. No cool-down cycle between substrates. No adhesive curing time. No outgassing risk. Seam contraction can generate controlled inter-layer forces, supporting direct glass core electrical contact architectures without additional interconnect steps.
FROM FIRST SAMPLE TO FULL PRODUCTION
One Platform. A Clear Path to Scale.
Every NEXAR process family is available in three configurations. M for manual loading across both wafer and panel formats: the right starting point for process development, technology evaluation, and pilot production. S for automated wafer handling with EFEM integration for semiconductor fab environments. P for full panel-level automation, built for 24/7 high-volume manufacturing of 515 mm × 510 mm.
| NEXAR M Systems | NEXAR S Systems | NEXAR P Systems | |
|---|---|---|---|
| Substrate Type | Multi Formats (Wafer & Panel) | Wafer Production | Panel Production |
| Wafer | Up to 300 mm | Up to 300 mm | - |
| Panel | 515 mm x 510 mm | - | 515 mm x 510 mm |
| Auto Loading | - | ✓ | ✓ |
| Manual Loading | ✓ | - | - |
| High Volume Production | - | ✓ | ✓ |
| R&D and Pilot Line System | ✓ | - | - |
| LIDE | ✓ | ✓ | ✓ |
| Tensor Ablation | ✓ | ✓ | ✓ |
| Tensor Bonding | ✓ | ✓ | ✓ |


