Advanced Packaging

Tensor Bonding Technology

Permanent bonds.
Zero adhesives.
Reliable Process.

LPKF Tensor Bonding

Glass-to-Glass Bonding at Panel Level. Fast. Robust. Permanent.

LPKF Tensor Bonding delivers reliable glass-to-glass bonds  through advanced laser welding technology eliminating adhesives, reducing thermal budgets, and enabling true 3D glass integration for advanced packaging architectures.

What Makes Tensor Bonding Different  

Conventional glass bonding methods demand near-perfect surface conditions, introduce adhesive contamination risks, or fall short at production scale. LPKF Tensor Bonding solves all three. Powered by proprietary high-speed beam deflection, it delivers direct, adhesive-free glass-to-glass fusion with a low thermal budget, across multiple glass types.

  • Superior gap bridging without adhesives — Bonds reliably across single-digit micrometer gaps, tolerating TTV variation and ISO 6 particle levels. No surface conditioning required.
     
  • Up to 200 mm/s freeform bonding — Programmable paths process only where the design demands, cutting cycle time without sacrificing precision.
     
  • Validated at up to 600 × 600 mm panel scale — Uniform bond quality across large substrates, production-ready for glass core substrates and co-packaged optics.

LPKF Tensor Bonding eliminates traditional bonding limitations:

Superior gap bridging

Extended weld pool technology bridges single-digit micrometer gaps between glass substrates, compensating for TTV variations and typical particle contamination.

 

Zero contamination

 Direct bonding without adhesives, glass frit, or intermediate layers. No organic materials, no outgassing, no degradation over time and has broad material compatibility.

 

Low thermal budget

Highly localized laser heating keeps bulk substrate to room temperature. Heat load is so localized that bonding can be applied to areas close to LIDE micro-structured glass without damage unlike fusion bonding (400-750°C) or anodic bonding (200-550°C).
 

 High-speed freeform bonding

Rapid bonding with scanning speeds up to 250 mm/s along programmable, arbitrary bonding paths instead of full-area bonding. 
 

 

 Traditional Bonding vs. LPKF Tensor Bonding


Challenge

Traditional Methods

LPKF Tensor Bonding

Process Temperature

High – 200-750°C sustained heating across entire substrate; incompatible with pre-assembled components and LIDE microstructures

Highly localized – Localized heating only, bulk substrate remains at room temperature, compatible with adjacent LIDE features

Bonding Mechanism

Intermediate layers – Adhesives, glass frit, or high-voltage fields required

Direct bonding – Extended weld pool via high-speed laser beam deflection with no intermediate materials

Gap Tolerance

Minimal – Requires near-perfect flatness and cleanliness; sensitive to particles and TTV

Single-digit µm bridging – Compensates for TTV and ISO 6-level particle contamination

Processing Time

Hours to minutes – Fusion: 1-18 hours; Anodic: 10-60 min

Seconds – Rapid scanning with ultrafast pulses, production-grade throughput (dependent on weld seam length)

Material Compatibility 

Limited – Requires specific glass types (alkali content for anodic) or matched CTE

Broad compatibility – Borosilicate, fused silica

Bonding Pattern

Full area or limited geometry – Often requires bonding entire surfaces 

Freeform local seams – Programmable arbitrary paths around features, cavities, specific regions

Contamination  Risk

High – Adhesive outgassing, organic residues, degradation over time

Zero – No adhesives, no intermediate layers, no organic materials

 Technical Specifications

 
Production Performance


Throughput: 600-4000 mm bond seam per minute (panel-dependent)

Cleanroom compatible: Class1000 or more operation (ISO 5-6)

Uptime: >90% for continuous production with predictive maintenance

Process robustness: Tolerates as-manufactured glass variations and typical cleanroom contamination

 

 
Quality & Control


Alignment accuracy (Layout to weld seam): <5 µm (integrated vision system)

Gap tolerance: Bridges gaps caused by TTV and ISO 6-level particle contamination

Thermal compatibility: Can be applied close to LIDE micro-structured features

Bonding Capabilities


Bonding speed: up to 200 mm/s scanning speed (application-dependent)

Gap bridging capability: up to 15 µm

Bond seam: 50 µm (configurable)

Substrate thickness range: 100 µm to 6+ mm per substrate

Panel size capability:  up to 600mm × 600mm

 

 
Unique Capabilities for Glass Core Substrates

 

Freeform bonding: Multi-layer glass with LIDE-processed TGVs, cavities, and cleaving features

Seam contraction: Vertical force for electrical connections between copper pads across glass layers

Localized heating: Damage-free bonding adjacent to delicate LIDE microstructures

Uninterrupted workflow: Integrates into complete glass processing workflow

 

 
Applications

 

Multi-layer glass core substrates: TGVs and LIDE microstructures for 2.5D/3D heterogeneous integration

Photonic packaging: Photonic IC encapsulation, laser component packaging, and waveguide integration for co-packaged optics

Hermetic sealing: Ultra-low WVTR sealing for OLED, display, and moisture-sensitive optoelectronic devices

Microfluidics: Biocompatible glass bonding for microfluidic chips, lab-on-glass devices, and implantable sensors

Optical Systems: Low-loss encapsulation for RF MEMS, 5G/6G antenna-in-package, automotive LiDAR, and industrial sensors

Why Tensor Bonding Matters

The Future of Glass Integration Requires Better Bonding

As advanced packaging moves toward glass substrates for superior electrical performance, thermal management, and form factor scaling, the limitations of traditional bonding become critical bottlenecks.

 

LPKF Tensor Bonding is purpose-built for next-generation packaging demands:

  • True 3D Integration – Stack multiple glass layers without thermal damage, CTE stress, or warpage 
  • Reliable Sealing – Ultra-low WVTR performance for moisture-sensitive devices and vacuum encapsulation
  • Manufacturing Efficiency – Seconds-scale bonding eliminates hours-long furnace processes
  • Design Freedom – Freeform bonding paths enable selective bonding around cavities and complex features

 

The result? Production-ready glass bonding that enables multi-layer glass core substrates with integrated TGVs, waveguides, and electrical interconnects without the limitations of conventional methods.

Ready to enable multi-layer glass integration without thermal damage?

Contact our application engineering team to explore how LPKF Tensor Bonding can accelerate your glass core substrate development and production.

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